Applied Materials
E 500 EHPI Medium Current alternatives
Comparable Ion Implantation equipment documented in the Waferpedia catalog.
6 comparable tools
Varian
EHPI 500
Ion Implantation
The Varian EHPi 500 is a medium current ion implanter offering an energy range of 5–260 keV (X+) and capable of handling wafer sizes up to 200 mm for features down to 0.18 µm.
Axcelis
NV 8250
Ion Implantation
The Axcelis NV 8250 is an ion implanter for 8-inch wafer processing with an energy range of 0-250 keV.
Axcelis
NV 8250 HT Ion
Ion Implantation
Axcelis NV 8250 HT Ion Implanter is an 8-inch ion implanter with listed power and vacuum-related configuration details.
Varian
Viision 80
Ion Implantation
The Varian Viision 80 is an ion implanter described as a medium-current system for 8-inch wafers.
Applied Materials
0010-14300 Magnet Assy
Ion Implantation
Varian
0216 7696, E 11368072 ESC
Ion Implantation
The Varian 0216 7696, E 11368072 ESC is an electrostatic chuck (ESC) platen of the ADV-S type, categorized under ion implantation equipment.
Compare interactively
Need a side-by-side spec table? Open the compare tool to pick any two models.
Compare E 500 EHPI Medium Current with another model →