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Comparison ledger

0010-16392 ESC AssemblyversusCentura AP Enabler Dielectric

Applied Materials 0010-16392 ESC Assembly, Applied Materials Centura AP Enabler Dielectric, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
OEMApplied MaterialsApplied Materials
CategoryEtchEtch
Wafer size—Diameter 300+/- 0.05mm(SEMI M28), 775 +/- 25um, Notch
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyApplied Materials Centura
Cited variants—
  • Centura AP Enabler E5[1]
Specifications
OEMApplied Materials[2]—
Model0010-16392[2]—
TypeESC Assembly[2]—
Wafer Size300 mm[3]Diameter 300+/- 0.05mm(SEMI M28), 775 +/- 25um, Notch[4]
Electrode ConfigurationDual[3]—
Configuration—HDD not included[4]
Online Connection—GEM / CIM JGJ (Hardware Interface : Ethernet 100Base-Tx)[4]
Inter Face—3 carrier stage (Continuous flow operation) w/ 3 Loadports (Semi compliant[4]
Interface A—Hardware related to EDA[4]
Corrosion Resistant FI & SWLL—N/A[4]
Loader Mod Corrosion Prevent—N/A[4]
Standard SWLL—Standard SWLL[4]
Side Storage Pod—Side Storage Pod (Left/Right)[4]
OCR—KIT, YAT BACKSIDE OCR, 300MM 5.3FI[4]
Facility Plate—N2 Regulator : Supplied by customer in floor, CDA regulator 125 PSI onboard[4]
Transfer Pressure Monitor—10 Torr Manometer and 1SLM N2 APC, kit[4]
Load Lock Pressure Monitor—GAUGE VAC MINI-CONVECTRON W/1-SETPOINT CAJON FTG analog[4]
Transfer Chamber Blade Kit—Transfer Chamber Accelerator Blade Kit[4]
LL ISO-Slit Valve Grp Elast.—AP Chemraz 513 Elastomer[4]
Interface—3 carrier stage (Continuous flow operation) w/ 3 Loadports (Semi compliant[4]
Atmospheric Robot—KAWASAKI A3[4]
Mainframe Robot—VXP with Dual blade[4]
Loadport Type—Enhanced 25 wafer FOUP[4]
Loadports—Loadport System[4]
EMO Type—Turn to Release (Front x3, Rear x4) - 3 on FI, 1 on front of FI and one on each side of FI. Rear: 1 for each process chamber.[4]
System Monitors—Monitor #1 is Flat Panel with Keyboard on stand / Monitor #2 is through the wall flat panel (optional)[4]
Voltage—208V, 50/60Hz[4]
Vintage—2010[4]
Description—Dielectric Etch[5]
Version—300mm[6]
Process Chambers—4 process chambers[1]
Fab Interface Type—Centura Etch 5.3 FAC. Frame 5.3 Fi Rev 002[1]
RF Gen Top (162MHz Source)—3500W RF POWER SUPPLY, 162 MHZ, FIXED FREQUENCY, 208VAC, WATER COOLED (0190-29389)[1]
RF Gen #1 Bottom (13MHz Bias)—RF GENERATOR, 13MHZ 5KW, 300MM, RACK MOUNT (0190-15319)[1]
RF Gen #2 Bottom (2MHz Bias)—RF GEN PLASMA 9KW 2MHZ ENI (0190-29586)[1]
Endpoint Type—Endpoint type (Eye-D) (0246-00196)[1]
TMP—Shimadzu D3403M, 3000 litre TMP[1]
Dry Pump—N(ESR80WN (EBARA); customer Supply)[1]
Chamber Controller Module—SBC C400MHZ, 3U CPCI, 256MB RAM[1]
Gas Line 1—C4F6 100 sccm UNIT IFC-125[1]
Gas Line 2—CH2F2 100 sccm UNIT IFC-125[1]
Gas Line 3—C3F8 50 sccm UNIT IFC-125[1]
Gas Line 4—O2_M 300 sccm UNIT-125[1]
Gas Line 5—SO2 200 sccm UNIT IFC-125[1]
Gas Line 6—CF4 200 sccm UNIT IFC-125[1]
Gas Line 7—C4F6_IGI 5 sccm UNIT-125[1]
Gas Line 8—O2_IGI 5 sccm UNIT-125[1]
Gas Line 9—O2_L 50 sccm UNIT-125[1]
Gas Line 10—O2_H 5000 sccm UNIT-125[1]
Gas Line 11—Ar 2000 sccm UNIT-125[1]
Gas Line 12—N2 200 sccm UNIT-125[1]
Gas Line 13—CHF3 200 sccm UNIT-125[1]
Gas Line 14—C4F8 100 sccm UNIT-125[1]
Source Bottom Ring—QUARTZ RING SOURCE, E5 (0200-07362)[1]
Showerhead Assy—Showerhead Assy, 4mm SiC Top Electrode Tokai (0041-32335)[1]
Wafer Pass Through—Not available[4]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]fabsurplus.comfabsurplus.com
  2. [2]Equipment inventory listing
  3. [3]spwindustrial.comspwindustrial.com
  4. [4]inventory listing
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]fabsurplus.comfabsurplus.com