Waferpedia

Comparison ledger

AS 2000versusPA 300 Control

SCREEN AS 2000, SUSS MicroTec PA 300 Control, side by side. Every value shown is drawn from the cited encyclopedia entries.

Documented as functional equivalents— Same function class: CMP, null[1]
Side-by-side comparison of selected equipment models
Attribute
AS 2000SCREEN
PA 300 ControlSUSS MicroTec
OEMSCREENSUSS MicroTec
CategoryCMPCMP
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySCREEN AS 2000SUSS MicroTec PA 300
Specifications
ConfigurationDual brush and top side brush chambers, spin dry[2]500 VA, 115V, 60Hz[5]
Gas1:100 DHF, 1:100 NH4OH[2]—
OSWindows NT[2]—
Power0.750KVA transformer[3]500 VA, 115V, 60Hz[5]
MissingHLS cards / condition not well[3]—
Wafer Size8 inch[4]—
Brush ChambersDual brush and top side brush chambers[2]—
Spin DryYes[2]—
Process Gases1:100 DHF, 1:100 NH4OH[2]—
Operating SystemWindows NT[2]—
Vintage Year (example unit)1998[2]—
Vintage Year (another unit)1999[3]—
Category—CMP[1]
Wafer handling—12" Nickel Plated Aluminum Chuck[5]
Control & software—ATT M300 Temp Control Unit[1]
Optics—10X, 2X Mitutoyo Plan Apo Objective, 2ea[5]
Configuration & options—Cascade CMPS-888 Microscope; Suss PH150 Micropositioner, 4ea[5]
Chuck—12-inch nickel plated aluminum chuck[5]
Control unit—ATT M300 Temp Control Unit[1]
Microscope—Cascade CMPS-888 Microscope[5]
Micropositioners—Suss PH150 Micropositioner, 4ea[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]Equipment inventory listing
  5. [5]inventory listing