Comparison ledger
Oxford Instruments Plasmalab 100 ICP-RIE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Plasmalab 100 ICP-RIEOxford Instruments | 1512eTegal |
|---|---|---|
| OEM | Oxford Instruments | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments Plasmalab 100 | Tegal 1512e |
| Specifications | ||
| Process gases used | H2, O2, N2, Ar, CF4, SF6, CHF3, He, CH4, HBr, Cl2 and BCl3[1] | — |
| Cryo Table w/ operating temp | -150 to 400C[1] | — |
| Substrate cooling | using liquid nitrogen (LN2)[1] | — |
| Configuration | RF source 300 W, 13.56 MHz[1] | — |
| Base pressure | 5E-7 Torr[1] | — |
| Main Chamber Backing Pump | Adixen ADP 122P Dry pump[1] | — |
| Main Chamber Turbo Pump | Adixen ATH 1300 Turbo[1] | — |
| Load Lock | Adixen ACP 15G Dry pump[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[2] |
| Stated configuration | — | With modules assembly for CI-4222[2] |
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