Comparison ledger
Nikon NSR S 203 B, Nikon NSR S 203 B DUV, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 203 BNikon | NSR S 203 B DUVNikon |
|---|---|---|
| OEM | Nikon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR S 203 | Nikon NSR S 203 |
| Specifications | ||
| Software Version | MCSV[1] | — |
| CIM | SECS[1] | — |
| Handler System | WL Type 3[1] | — |
| Factory Interface | Open Cassette[1] | — |
| Excluded | Hard Drives (2)[1] | — |
| Process | Scanner[2] | — |
| Configuration | 248 nm[2] | with Cymer ELS 5410[6] |
| Handler | WL Type 3[4] | — |
| IU Flare | 0.84%[4] | — |
| Lens Flare | 8.50%[4] | — |
| Uniformity | 6.00%[4] | — |
| Power | 541 mW/cm2[4] | — |
| Total Focus Deviation | 0.202 µm[4] | — |
| Astigmatism | 0.119 µm[4] | — |
| Coma | 0.040 µm[4] | — |
| ISO DOF | 0.275 µm[4] | — |
| Wafer size | 200 mm (8 inch)[1] | — |
| Wavelength | 248 nm[2] | — |
| Process type | Scanner[2] | — |
| CIM interface | SECS[1] | — |
| Iso DOF | 0.241 µm[5] | — |
| Light source | Cymer ELS 5410[3] | — |
| Manufacturer | Nikon[1] | — |
| Model | NSR S 203 B[1] | — |
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