Comparison ledger
Nikon NSR 204 B, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR 204 BNikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR 204 B | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Wafer size | 8 inch[1] | — |
| Exposure source | DUV (KrF laser, GIGAPHOTON G20K2)[2] | — |
| Year of manufacture | 2000[1] | — |
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