Comparison ledger
Nikon 1505 G 6 E, Ultratech Titan 4700, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | Titan 4700Ultratech |
|---|---|---|
| OEM | Nikon | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | Ultratech Titan 4700 |
| Specifications | ||
| Configuration | 5" reticle[1] | — |
| Resolution | 650 nm[2] | — |
| Numerical Aperture | 0.54[2] | 0.32[4] |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | — |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| Optics | — | G and H line[4] |
| Lamp Power | — | 1000 W[4] |
| Extended Focus Option | — | Yes (for thick resist exposure)[4] |
| Wafer Sizes Supported | — | 4 inch, 5 inch, 6 inch, 8 inch[4] |
| Reticle Size | — | 5 inch (upgradable to 6 inch)[4] |
| Maximum Field of View | — | 44 mm x 26.7 mm[4] |
| Robot | — | Genmark[4] |
| Machine Vision System | — | Cognex[4] |
| Reticle Bar Code Reader | — | Yes[4] |
| Auto Aperture | — | For 2 or 3 field reticles[5] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →