Comparison ledger
Nikon 1505 G 6 E, SUSS MicroTec MA 150 CC Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | MA 150 CC MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | SUSS MicroTec MA 150 |
| Specifications | ||
| Configuration | 5" reticle[1] | Topside Alignment[4] |
| Resolution | 650 nm[2] | — |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | SUSS[4] |
| Model | 1505 G 6 E[1] | MA 150 CC[4] |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| Max Wafer Size | — | 6"/150mm Wafer Capable[4] |
| Tool type | — | Mask Aligner[4] |
| Wafer sizes | — | 2, 3, 4, 5, 6 inch[4] |
| Topside alignment | — | Supported[4] |
| Operation mode | — | Automatic or manual mode[4] |
| Alignment | — | Automatic alignment[4] |
| Prealigner | — | Optical prealigner[4] |
| Lamp house | — | 1000 Watt lamphouse[4] |
| Optics | — | UV400 optics for 365nm and 405nm exposure[4] |
| Front lens | — | UV400 front lens[4] |
| Lamp power supply | — | Suss CIC 1000 Lamp Power Supply[4] |
| Microscope | — | Suss DVM 6 Microscope[4] |
| Camera | — | CCD camera right and left[4] |
| Contact exposure modes | — | Hard, soft, and vacuum contact exposure modes[4] |
| Display | — | Flat panel touchscreen[4] |
| Documentation | — | Operations manual[4] |
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