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Comparison ledger

1505versus1505 G 6 Eversus1505 G 7 E

Nikon 1505, Nikon 1505 G 6 E, Nikon 1505 G 7 E, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1505Nikon
OEMNikonNikonNikon
Category—LithographyLithography
Wafer size———
Process node———
Introduced———
Production run—1988–—
Lifecycle———
Lifecycle milestones———
Control system———
Generation———
FamilyNikon 1505Nikon 1505Nikon 1505
Specifications
Exposure wavelengthg-line[1]——
Numerical aperture0.54 NA[1]——
Configuration—5" reticle[2]5" reticle[4]
Resolution—650 nm[3]—
Numerical Aperture—0.54[3]—
Reduction—5x[3]—
Exposure Field—15 x 15 mm[3]—
Alignment Accuracy—130 nm[3]—
Wafer Size—4 inch[2]—
Light Source—g-line[1]—
Introduction Year—1988[3]—
NA (Numerical Aperture)—0.54[3]—
Make—Nikon[2]—
Model—1505 G 6 E[2]—
Category—Stepper[2]—
Wafer Sizes—4 inch[2]—
Exposure type—g-line[3]—
NA—0.54[3]—
Exposure field—9.3 x 18.8 mm[3]—
Wafer size——6 inch[4]
Reticle size——5 inch[4]
Sources (4)Every fact above is drawn from these public sources
  1. [1]ece.utoronto.caece.utoronto.ca
  2. [2]inventory listing
  3. [3]web.archive.orgweb.archive.org
  4. [4]inventory listing