Comparison ledger
KLA TP 500 Implant Dose Measurement, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 160 XPVarian | |
|---|---|---|
| OEM | KLA | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA TP 500 Implant Dose Measurement | Varian 160 XP |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Single Phase[2] | — |
| Voltage | 120 V[2] | — |
| Circuit Breaker | 20[2] | — |
| Full Current Load | 7.5[2] | — |
| Power Configuration | Single Phase[2] | — |
| Frequency | 50/60 Hz[2] | — |
| Circuit Breaker Rating | 20[2] | — |
| Optics Configuration | Camera Only[3] | — |
| Wafer Size | 200 mm[5] | — |
| Configuration (160 XP Ion variant) | — | 150mm High Current IMP[1] |
Plan your fab
Building a Ion Implantation process? Get a complete equipment list.
Open the fab equipment planner →