Comparison ledger
Dektak 6M, Semitool 11600 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 6MDektak | 11600 SRDSemitool |
|---|---|---|
| OEM | Dektak | Semitool |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | 6" | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Dektak 6M | Semitool 11600 SRD |
| Specifications | ||
| Instrument type | Stylus profilometer[1] | — |
| Equipment type | Cleanroom Instrumentation; Metrology; Microscopy/Surface Analysis; Surface Analysis[1] | Spin Rinse Dryer[2] |
| Measured feature | Film step height[1] | — |
| Measurement range | Steps from 260 microns down to 10 nm[1] | — |
| Additional uses | Surface topography profiling and surface roughness measurement in the nanometer range[1] | — |
| Stylus radius | 25-micron radius high aspect ratio stylus[1] | — |
| Maximum acceptable sample size | 6 inches[1] | — |
| Location | FNT 4.106[1] | — |
| Contact | Dr. Raluca Gearba[1] | — |
| Step height measurement range | 260 µm to 10 nm[1] | — |
| Maximum sample size | 6 inches[1] | — |
| Configuration | — | Ceramic[2] |
| Manufacturer | — | Semitool[2] |
| Model | — | 11600 SRD[2] |
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