Waferpedia

Comparison ledger

017-0024-01 PrealignerversusEV-420

Brooks 017-0024-01 Prealigner, EV Group EV-420, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
EV-420EV Group
OEMBrooksEV Group
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0024-01 PrealignerEV Group EV-420
Specifications
Equipment type—front & backside mask aligner[1]
Type—Front & backside mask aligner[2]
Exposure source—UV[3]
Exposure dose (as stated)—625 mJ/cm²[3]
UV source intensity—625 mJ/cm² (measured during exposure)[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]nanofab.utah.edunanofab.utah.edu
  2. [2]nanofab.utah.edunanofab.utah.edu
  3. [3]repository.tudelft.nlrepository.tudelft.nl