Comparison ledger
ASML XT 1400 D ArF, CEE 100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | XT 1400 D ArFASML | 100CEE |
|---|---|---|
| OEM | ASML | CEE |
| Category | Lithography | Lithography |
| Wafer size | Wafer Stage | 6" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML XT 1400 D ArF | CEE 100 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Process Module:[2] | — |
| Wafer size | Wafer Stage[2] | Up to 6 inches[3] |
| Tool type | — | Spray Developer[1] |
| Accepts wafer size | — | up to 6" wafers[3] |
| Programmable programs | — | 10 programs[3] |
| Steps per program | — | up to 10 steps[3] |
| Programmable step parameters | — | Acceleration, Speed, Time[3] |
| Associated document | — | CEE Model 100CB Spinner.doc[3] |
| Programs | — | 10 programs each with up to 10 steps[3] |
| Control parameters | — | Acceleration, Speed, Time[3] |
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