Comparison ledger
Applied Materials Mirra Mesa, Lam Research IPEC AvantGaard 776, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Mirra MesaApplied Materials | IPEC AvantGaard 776Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | CMP | CMP |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Mirra Mesa | Lam Research IPEC |
| Cited variants |
| |
| Specifications | ||
| CMP Model | Mirra Mesa[5] | — |
| Process | OX[5] | Tungsten[3] |
| Polisher System Module | 4 Head 3 Platen[5] | — |
| Configuration | Platen 1 configuration:[5] | Dielectric[1] |
| Platen 1 Type | With window, belt + gear CVT[5] | — |
| Platen 1 endpoint | Full scan and motor torque[5] | — |
| Platen 1 slurry arm | Standard tunable[5] | — |
| Platen 1 pad conditioner arm | Standard[5] | — |
| Platen 2 Type | With window, belt + gear CVT[5] | — |
| Platen 2 endpoint | Full scan[5] | — |
| Platen 2 slurry arm | Standard tunable[5] | — |
| Platen 2 pad conditioner arm | Standard[5] | — |
| Platen 3 Type | With window, belt + gear CVT[5] | — |
| Platen 3 endpoint | Full scan[5] | — |
| Platen 3 slurry arm | Standard tunable[5] | — |
| Platen 3 pad conditioner arm | Standard[5] | — |
| Polishing head | 3 zone[5] | — |
| Slurry Delivery | 2 types of slurry[5] | — |
| Model | Mirra Mesa[5] | AvantGaard 776[4] |
| Category | CMP (Chemical Mechanical Polisher)[5] | CMP[4] |
| Slurry flow rate control | Peristaltic pump[5] | — |
| FABs port | 3 Port[5] | — |
| Electrical requirements | 50/60 HZ; 200-230V; three-phase four-wire[5] | — |
| Cleaner quantity | 1 unit[5] | — |
| Cleaner robot | working beam Megasonics Module[5] | — |
| Cleaning method | Vertical[5] | — |
| Megasonics delivery type | 2 Chem flow meter type[5] | — |
| Brush 1 clean | 1 Chem and DIW[5] | — |
| Brush 1 flow type | flow meter type[5] | — |
| Brush 2 clean | 1 Chem and DIW[5] | — |
| Brush 2 flow rate | flow meter type[5] | — |
| Dry type | Spin Dryer[5] | — |
| Drying | Lamp heater Drying; N2 Drying[5] | — |
| Line Frequency | 50/60 HZ[5] | — |
| OEM | Applied Materials[5] | — |
| Facilities option | EMO Guard Ring[5] | — |
| Line voltage | 200-230V[5] | — |
| Connection | Three-phase four-wire[5] | — |
| Power lamp | Green Lamp[5] | — |
| Power connected lamp | Power Connected Lamp[5] | — |
| GFI type | STANDARD 30mA[5] | — |
| Make | — | Lam / IPEC[3] |
| Wafer size | — | 8 inch[3] |
| Wafer size (version) | — | 200 mm[6] |
| Asset description | — | CMP system for spares use[6] |