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0010-22161 High EFF RF MatchversusCH24P1

Applied Materials 0010-22161 High EFF RF Match, MKS CH24P1, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsMKS
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-22161 High EFF RF MatchMKS CH24P1
Cited variants—
  • RPS-CH24P1-P24C[1]
Specifications
MakeApplied Materials[2]—
Model0010-22161[2]—
DescriptionHTESC PH 1 REV A[3]—
ConditionUsed[3]—
Stock NumberBM6628[3]—
Output Power—24 kW[4]
Power Set Point Accuracy—±1%[4]
Communication Interface—EtherCAT or Analog DB25[4]
Design—Compact split applicator power design[4]
Application—High flow applications[4]
Type—Remote Plasma Source for High Flow Applications[1]
Power Output—24 kW[1]
RF Frequency—400 kHz[1]
Accuracy—±1% to power set point[1]
Gas Supply During Ignition—Ar NF3[1]
Operating Window—1-25 slm 20T[5]
Mixed Species Space—30-90 slm[5]
Compatible Species—NF3, O2, N2, Ar[1]
THD—<15%[1]
Inlet Gas Connection—KF40[1]
Outlet Gas Connection—KF50[1]
Control Interface—Analog: DB25; Digital: EtherCAT[1]
Power Requirements—208 V, 3 phase 50/60 Hz, 75 Amps RMS max phase[1]
Dimensions—Remote Head: 22.02 x 10.76 x 11.1 in. (55.93 x 27.33 x 28.19 cm); Power Supply: 21.24 x 19.00 x 7.0 in. (53.95 x 48.26 x 17.78 cm)[1]
Weight—Remote Head: 100 lbs. (45.36 kg); Power Supply: 62 lbs. (28.12 kg)[1]
Compliance—SEMI F47[1]
Sources (5)Every fact above is drawn from these public sources
  1. [1]mks.commks.com
  2. [2]Equipment inventory listing
  3. [3]tarasemi.comtarasemi.com
  4. [4]api.p1.mks.comapi.p1.mks.com
  5. [5]api.p1.mks.comapi.p1.mks.com