Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Hitachi 9220, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | 9220Hitachi |
|---|---|---|
| OEM | Applied Materials | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Hitachi 9220 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Length Measurement Reproducibility | — | ± 1% or 3 nm (3σ) larger value[3] |
| Secondary Electron Image Resolution | — | 3 nm at acceleration voltage 0.8 kV[3] |
| Acceleration Voltage | — | 500 to 1600 V (variable in 10 V steps)[3] |
| Throughput (continuous measurement mode) | — | 56 wafers / hr[3] |
| Measuring Range | — | 0.1 μm to 2.0 μm[3] |
| Image Magnification (SEM) | — | 1k to 300k times[3] |
| Stage Movement Range (X-axis) | — | 0-200 mm[3] |
| Stage Movement Range (Y-axis) | — | 0-200 mm[3] |
| Stage Drive Speed | — | Max. 100 mm / sec (each X-axis & Y-axis)[3] |
| Lens System | — | Electromagnetic Lens System, Booster Stock Lens[3] |
| Detection System | — | Scintillator / photomultiplier detector using EXB filter; 2 stage detection method for SE and BSE images[3] |
| Power Supply (208V variant) | — | 208 V, 60 Hz, Single Phase[3] |
| Power Supply (100V variant) | — | 100V, 60 Hz, Single Phase, 6kVA[3] |
| Power Supply (200V variant) | — | 200V, 60 Hz, Single Phase[3] |
| Wafer Sizes Supported | — | 2-inch, 8-inch, 12-inch[3] |