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Comparison ledger

0010-14300 Magnet AssyversusKestrel II 750

Applied Materials 0010-14300 Magnet Assy, Varian Kestrel II 750, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-14300 Magnet AssyApplied Materials
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer size—10 Site Disk, 10 Wafer per Batch
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-14300 Magnet AssyVarian Kestrel II 750
Specifications
ConfigurationP4 Magnet Assy, IMP[1]High current[2]
Gearbox P/N0010-27417[1]—
Part Number0010-14300[1]—
DescriptionP4 Magnet Assy, IMP[1]—
Energy Range—10 - 3750 kV[3]
Wafer size—10 Site Disk, 10 Wafer per Batch[4]
Voltage—30 kV Terminal PS[3]
Wafer Size—8 inch[2]
Batch Size—10 Wafers per Batch[3]
Disk Sites—10 Site Disk[3]
Gas Modules—4 Gas Modules[3]
Gases—Argon (factory inlet), PH3 SDS, AsH3 SDS, BF3 SDS[3]
Automatic Handling—Yes[3]
Software Version—6.41[4]
High Current—Yes[4]
Power Supply Interface (PSI) Controller—Included[4]
Source Vacuum Controller—Included[4]
Manipulator Controller—Included[4]
30 kV Terminal PS—Included[4]
60 kV Tube Lens PS—Included[4]
Category—Ion Implantation[4]
Handling system—Automatic Handling system[3]
Gas box—Fully Automated Gas Box, 4 Gas Modules[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com