Comparison ledger
Applied Materials 0010-13622 RF Match for, ENI DCG 100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | DCG 100ENI |
|---|---|---|
| OEM | Applied Materials | ENI |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | ENI DCG 100 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | 200-208v 3ph 48-62hz[3] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| PN | — | DCG 2 M-A 041300110 AL[2] |
| Input | — | 200-208 V, 35 A, 50-60 Hz[2] |
| Output | — | 10 kW[2] |
| Output Power | — | 10 kW[2] |
| Input Voltage | — | 200-208 V[2] |
| Input Current | — | 35 A[2] |
| Input Frequency | — | 50-60 Hz[2] |
| Input Phase | — | 3-phase[3] |
| Max Input Current (48-62 Hz) | — | 40 A[3] |
| Max Input Current (50-60 Hz) | — | 60 A[3] |
| Part Number | — | DCG 2 M-A 041300110 AL[2] |
| Vintage Year (unit-specific) | — | 2000[2] |
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