Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Lam Research SEZ RST 201, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | SEZ RST 201Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1997– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Lam Research SEZ |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | Single Cleaning[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | RST 201[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Lam / SEZ[5] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Wafer Sizes | — | 8 inch[5] |
| Tool type | — | single cleaning tool[5] |
| Process type | — | single-wafer wet chemical processor[6] |
| Process chamber count | — | single process chamber[6] |
| Load ports | — | two open-cassette load ports[6] |