Comparison ledger
Applied Materials 0010-03485 Magnet Assy, ESI 5200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | 5200ESI |
|---|---|---|
| OEM | Applied Materials | ESI |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | ESI 5200 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Rep Rate Range (kHz) | — | 3-20[5] |
| Max Work Surface Power (W) | — | 1.9[5] |
| Pulse Width (ns) | — | 22+/-10 @3kHz, 35 @10kHz, 55+/-30 @18kH[5] |
| Repetition Rate Range | — | 3-20 kHz[5] |
| Max Work Surface Power | — | 1.9 W[5] |
| Pulse Width @3kHz | — | 22±10 ns[5] |
| Pulse Width @10kHz | — | 35 ns[5] |
| Pulse Width @18kHz | — | 55±30 ns[5] |
| Vintage | — | 1998[5] |