Comparison ledger
Applied Materials 0010-03485 Magnet Assy, CEE Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | SpinCEE |
|---|---|---|
| OEM | Applied Materials | CEE |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | CEE Spin |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Equipment type | — | Spin coater[5] |
| Asset number | — | 142901[5] |
| Make | — | CEE[5] |
| Substrate size | — | up to 200mm round or 7 in. square[6] |
| Maximum spin speed | — | 6000 rpm[6] |
| Base system | — | Brewer Science CEE 200CBX precision coat-bake system[6] |
| Function | — | photoresist spinners[6] |
| Spin speed | — | up to 6000 rpm[6] |
| Spin Coater #1 feature | — | programmable Precision Hot Plate Bake[6] |
| Spin Coater #2 type | — | stand-alone spinner[6] |