Waferpedia

Comparison ledger

Maskversus017-0024-01 Prealigner

ABM Mask, Brooks 017-0024-01 Prealigner, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
MaskABM
OEMABMBrooks
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyABM MaskBrooks 017-0024-01 Prealigner
Cited variants
  • ABM3000HR Mask Aligner[1]
  • ABM Mask Contact Aligner[2]
—
Specifications
ConfigurationUsing 1000 Watt DUV light source[3]—
Tool typeMask aligner[3]—
Wafer sizes2 in, 3 in, 4 in, 12 in[3]—
Substrate capabilityFrom 100 mm down to small pieces[1]—
Light source1000 Watt DUV light source[3]—
Mask sizeUp to 5 in[3]—
Tool manufacturerABM[1]—
Tool model3000HR[1]—
Exposure methodsFlood, soft, hard, and vacuum contact[2]—
Exposure wavelengths365 nm to 400 nm[2]—
Resolution800 nm[2]—

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Sources (3)Every fact above is drawn from these public sources
  1. [1]wiki.nano.upenn.eduwiki.nano.upenn.edu
  2. [2]nist.govnist.gov
  3. [3]inventory listing