Comparison ledger
Tokyo Electron Clean Track Act 8 Resist, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Clean Track Act 8 ResistTokyo Electron | 1000FPYES |
|---|---|---|
| OEM | Tokyo Electron | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1998 Vintage year | — |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Clean Track | YES 1000FP |
| Cited variants | — | |
| Specifications | ||
| Configuration | Single Block[1] | — |
| System | Right to Left[4] | — |
| Main robot | 3 Pincette Arm[4] | — |
| Manufacturer | Tokyo Electron[1] | — |
| Model | Clean Track Act 8[1] | Glen/YES 1000FP[6] |
| Type | Resist Coater / Developer[1] | — |
| Wafer Sizes | 6 inch, 8 inch[3] | — |
| Equipment type | Resist coater/developer[1] | — |
| Supported wafer sizes | 6 inch, 8 inch[1] | — |
| Supported Wafer Size | 8 inch[1] | — |
| System type | — | Plasma cleaning system[6] |
| Line | — | R-Series Plasma Cleaning Systems (Glen Technologies)[6] |
| Designed use | — | Designed to accept a range of shelf sizes[6] |
| Application focus | — | Changing needs of the flat panel industry[6] |
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