Waferpedia

Comparison ledger

1512eversusTE 8401 Poly

Tegal 1512e, Tokyo Electron TE 8401 Poly, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1512eTegal
TE 8401 PolyTokyo Electron
OEMTegalTokyo Electron
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTegal 1512eTokyo Electron TE 8401
Cited variants—
  • TE 8401 (poly etch configuration)[1]
  • TE 8401 (nitride etch configuration)[1]
Specifications
Tool typeIndustrial RIE plasma etcher system[2]—
Stated configurationWith modules assembly for CI-4222[2]—
Configuration—Single chamber[3]
LD—2 each[3]
Gas—He, O2, CF4, HBr, CL2[3]
OS—EPROM based system[3]
Manufacturer—Tokyo Electron[3]
Model—TE 8401 Poly[3]
Pumps—2[3]
Gas delivery—He, O2, CF4, HBr, CL2[3]
Vintage—1998[3]
Wafer size—8-inch wafers[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]inventory listing