Comparison ledger
SUSS MicroTec RC 8 MS 3 Spin, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | RC 8 MS 3 SpinSUSS MicroTec | 1000PYES |
|---|---|---|
| OEM | SUSS MicroTec | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec RC 8 MS 3 Spin | YES 1000P |
| Specifications | ||
| Frequency | 50 Hz[1] | — |
| Voltage | 220 V[1] | — |
| Configuration | With controller[1] | Parallel plate[4] |
| Does not include add-ons (ex | edge bead removal / dispense and autoclean)[1] | — |
| Type | Spin coater[1] | — |
| Vintage | 2001[2] | — |
| Controller | With controller[1] | — |
| High Gyrset | 3, 5 and 8[2] | — |
| Air | 4-9 bar[2] | — |
| Vacuum | -0.6 bar[2] | — |
| Model | — | 1000P[3] |
| System type | — | Plasma cleaning system[3] |
| Shelf configuration | — | Four 16 x 16 inch shelves[3] |
| Total capacity | — | 1024 square inches[3] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[3] |
| Number of shelves | — | 4[3] |
| Shelf size | — | 16 x 16 inches[3] |
| Power | — | 1000 W[4] |
| Operation modes | — | Active, RIE, Downstream[3] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[3] |
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