Waferpedia

Comparison ledger

Ionfab 300 Plus IBD IBEversus1512e

Oxford Instruments Ionfab 300 Plus IBD IBE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Ionfab 300 Plus IBD IBEOxford Instruments
1512eTegal
OEMOxford InstrumentsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyOxford Instruments Ionfab 300Tegal 1512e
Specifications
Phase3 Phase[1]—
ConfigurationLoadlock and robot with secondary pumping, Vacuum can remain inside for higher throughput.[1]—
Tool type—Industrial RIE plasma etcher system[2]
Stated configuration—With modules assembly for CI-4222[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com