Comparison ledger
Nikon NSR S 208 D, Nikon NSR S 208 D KrF, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 208 DNikon | NSR S 208 D KrFNikon |
|---|---|---|
| OEM | Nikon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2004 Introduction |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR S 208 | Nikon NSR S 208 |
| Specifications | ||
| Configuration | Software ver. MCSW 180-P12/OCSW ver. 180-P10[1] | 110nm[3] |
| CIM | SECs[1] | — |
| Process | kRF[1] | — |
| Handler System | external FOUP system[1] | — |
| Factory Interface | SMIF[1] | — |
| Wavelength | 248 nm[2] | — |
| Lens NA | 0.82[2] | — |
| Exposure Area | 26 x 33 mm[2] | — |
| Reduction Ratio | 1/4[2] | — |
| Resolution | <110 nm[2] | 110 nm[4] |
| Throughput (300 mm) | >147 wph[2] | — |
| Throughput (200 mm) | >165 wph[2] | — |
| Wafer Size | 200/300 mm[2] | — |
| Software Version | MCSW 180-P12 / OCSW ver. 180-P10[1] | — |
| Components | Amp Rack, Temperature Controller, Cymer Laser, Air Conditioner[1] | — |
| Throughput | 300 mm > 147 WPH; 200 mm > 165 WPH[2] | — |
| Included modules | Amp Rack; Temperature Controller; Cymer Laser; Air Conditioner[1] | — |
| Numerical aperture (NA) | — | 0.82[4] |
| Wafer size | — | 200/300 mm[4] |
| Reduction factor | — | 4x[4] |
| Exposure field | — | 26 x 33 mm[4] |
| Alignment accuracy | — | < 10 nm[4] |
| Model | — | NSR S 208 D[5] |
| Type | — | KrF scanner[5] |
| Exposure wavelength | — | 248/KrF[4] |
| Reduction | — | 4x[4] |
| Numerical aperture | — | 0.82[4] |
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