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Comparison ledger

NSR 4425 i i-Lineversus150 e Mask

Nikon NSR 4425 i i-Line, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
OEMNikonSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones1996 Vintage year—
Control system——
Generation——
FamilyNikon NSRSUSS MicroTec 150 e Mask
Specifications
Configuration0.35um[1]—
Resolution0.35 µm[1]—
Wafer size8 inch[1]—
CategoryLithography[2]—
Vintage year1996[1]—

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com