Waferpedia

Comparison ledger

NSR 2205 i 11 C i-Lineversus1000 Family

Nikon NSR 2205 i 11 C i-Line, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1000 FamilyUltratech
OEMNikonUltratech
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run2001–—
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyNikon NSR 2205Ultratech 1000 Family
Specifications
Configuration0.40um[1]—
Resolution0.45um L&S[2]—
Total Focus Deviation0.45um L&S[2]—
Astigmatism0.35um L&S[2]—
Inclination0.40um[2]—
Lens Distortion0.55um[2]—
Mag Control Accuracy0.25um[2]—
Focus Control Accuracy0.2um[2]—
Wafer Size6 inch, 8 inch[1]—
Resolution (L&S)0.45 µm[2]—
Total Focus Deviation (L&S)0.45 µm[2]—
Astigmatism (L&S)0.35 µm[2]—
Magnification Control Accuracy0.25 µm[2]—
Tool type—Photolithography step-and-repeat 1X stepper[3]
Optical design—Wynne Dyson[3]
Magnification—1X[3]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]en.wikipedia.orgen.wikipedia.org