Comparison ledger
Nikon 1505 G 6 E, SUSS MicroTec MA1006, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | MA1006SUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | SUSS MicroTec MA1006 |
| Cited variants | — | |
| Specifications | ||
| Configuration | 5" reticle[3] | — |
| Resolution | 650 nm[4] | 1 micron on 6-inch wafers[7] |
| Numerical Aperture | 0.54[4] | — |
| Reduction | 5x[4] | — |
| Exposure Field | 15 x 15 mm[4] | — |
| Alignment Accuracy | 130 nm[4] | — |
| Wafer Size | 4 inch[3] | — |
| Light Source | g-line[5] | — |
| Introduction Year | 1988[4] | — |
| NA (Numerical Aperture) | 0.54[4] | — |
| Make | Nikon[3] | — |
| Model | 1505 G 6 E[3] | MA1006[6] |
| Category | Stepper[3] | — |
| Wafer Sizes | 4 inch[3] | — |
| Exposure type | g-line[4] | — |
| NA | 0.54[4] | — |
| Exposure field | 9.3 x 18.8 mm[4] | — |
| OEM | — | SUSS MicroTec[6] |
| Tool category on source page | — | Step Height PROFILOMETER[6] |
| Measured linewidth | — | 2 µm at full photoresist height (Shipley 1813 process)[8] |
| Wafer size | — | up to 150mm diameter[2] |
| Mask size | — | maximum 7" x 7"[2] |
| Exposure modes | — | Proximity, soft, hard, vacuum contact[2] |
| Exposure optics | — | UV400: 350-450nm; UV300: 280-350nm; Hg-lamp 350W or 1000W[2] |
| Exposure uniformity | — | ±5% typical for 150mm wafer[2] |
| Alignment step | — | 1μm steps[2] |
| Soft contact pressure | — | 2-8 N[2] |
| Hard contact pressure | — | Nitrogen pressure 0-2 bar[2] |
| Vacuum contact level | — | < -0.8 bar[2] |
| Dimensions (W×H×D) | — | ca. 920mm × 1600mm × 870mm[2] |
| Weight | — | ca. 450 kg[2] |
| Power requirement | — | 350W lamp: 1200 VA; 1000W lamp: 2000 VA[2] |
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