Comparison ledger
Nikon 1505 G 6 E, Nikon NSR S 208 D, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | NSR S 208 DNikon |
|---|---|---|
| OEM | Nikon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | Nikon NSR S 208 |
| Specifications | ||
| Configuration | 5" reticle[1] | Software ver. MCSW 180-P12/OCSW ver. 180-P10[4] |
| Resolution | 650 nm[2] | <110 nm[5] |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | 200/300 mm[5] |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | — |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| CIM | — | SECs[4] |
| Process | — | kRF[4] |
| Handler System | — | external FOUP system[4] |
| Factory Interface | — | SMIF[4] |
| Wavelength | — | 248 nm[5] |
| Lens NA | — | 0.82[5] |
| Exposure Area | — | 26 x 33 mm[5] |
| Reduction Ratio | — | 1/4[5] |
| Throughput (300 mm) | — | >147 wph[5] |
| Throughput (200 mm) | — | >165 wph[5] |
| Software Version | — | MCSW 180-P12 / OCSW ver. 180-P10[4] |
| Components | — | Amp Rack, Temperature Controller, Cymer Laser, Air Conditioner[4] |
| Throughput | — | 300 mm > 147 WPH; 200 mm > 165 WPH[5] |
| Included modules | — | Amp Rack; Temperature Controller; Cymer Laser; Air Conditioner[4] |
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