Comparison ledger
Neslab HX 500 Chiller, Tri -Mist 850 Electronic Air Filter, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | HX 500 ChillerNeslab | |
|---|---|---|
| OEM | Neslab | Tri |
| Category | Lab & Support Equipment | Lab & Support Equipment |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Neslab HX 500 Chiller | Tri -Mist 850 Electronic Air Filter |
| Specifications | ||
| Pump Type | CP-55[1] | — |
| Controller | Digital, non bath[1] | — |
| Configuration | 440-480V[1] | — |
| Frequency | 60Hz[1] | — |
| Phase | 3 Phase[1] | — |
| Refrigerant | R-22[1] | — |
| Make | Neslab[1] | — |
| Model | HX 500[1] | — |
| Power | 440-480V[1] | — |
| Temperature range | 5°C to 35°C[2] | — |
| Stability | ± 0.1°C[2] | — |
| Condenser | air or water cooled[2] | — |
| Reservoir size | 28 gallons / 106 liters[2] | — |
| Cooling capacity at 60 Hz and 20°C | 15,700 watts[2] | — |
| Cooling capacity at 50 Hz and 20°C | 13,030 watts[2] | — |
| Pump performance at 60 Hz, Pump 1 | 23 gpm at 50 psig (TU 9)[2] | — |
| Pump performance at 60 Hz, Pump 2 | 19 gpm at 50 psig (CP 75)[2] | — |
| Pump performance at 50 Hz, Pump 1 | 16 gpm at 50 psig (TU 9)[2] | — |
| Pump performance at 50 Hz, Pump 2 | 10 gpm at 40 psig (CP 75)[2] | — |
| Power requirements at 60 Hz | 208-230V 3ø / 460V 3ø[2] | — |
| Power requirements at 50 Hz | 380-415V 3ø[2] | — |
| Unit dimensions (H x W x D) | 51.625 x 46 x 28.75 in / 131.1 x 116.8 x 73 cm[2] | — |
| Plumbing connections, inlet/outlet process | 1 in. FNPT[2] | — |
| Plumbing connections, inlet/outlet facility | 1 in. FNPT[2] | — |
| Plumbing connection, drain | 1/2 in. FNPT[2] | — |
| Plumbing connection, auto refill | 3/8 in. OD SS barb[2] | — |
| Unit weight | 746 lb / 338.4 kg[2] | — |
| Applications | Lasers, process cooling, MRI, medical lasers, linear accelerators, diffusion pumps, vacuum systems, plasma etch equipment[3] | — |
| Equipment type | Environmental[4] | — |
| Cooling type | Water cooled chiller[4] | — |
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