Waferpedia

Comparison ledger

EDC-HL-8 BversusWS-650-8 B

Laurell EDC-HL-8 B, Laurell WS-650-8 B, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
EDC-HL-8 BLaurell
WS-650-8 BLaurell
OEMLaurellLaurell
CategoryResist ProcessingResist Processing
Wafer size200mm200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLaurell EDC-HL-8 BLaurell WS-650-8 B
Specifications
ModelEDC-HL-8 B[1]WS-650-8 B[1]
OEMLaurell[1]Laurell[1]
TypeEDC System[1]Spin Coater[1]
Series650-series[1]—
Max. Substrate Size200mm (7" x 7")[1]200mm (7" x 7")[1]
Max. RPM12000 rpm[1]12000 rpm[1]
Mounting OptionsTabletop, In-Deck, On-deck[1]Tabletop, In-Deck, On-deck[1]
Controller—650-series[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]images.laurell.comimages.laurell.com