Waferpedia

Comparison ledger

Gasonics Aura 1000versus1000FP

Lam Research Gasonics Aura 1000, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Gasonics Aura 1000Lam Research
OEMLam ResearchYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research Gasonics Aura 1000YES 1000FP
Specifications
ConfigurationTabletop (4)[1]—
ConfigurationsTabletop (4) or Floor (1)[1]—
Power Requirement208VAC 3-Phase[2]—
Process GasesO2, CF4[2]—
Plasma SourceMicrowave (magnetron)[2]—
Chamber MaterialCeramic/Quartz[2]—
Pneumatics PowerNitrogen or Clean Dry Air (CDA)[2]—
System type—Plasma cleaning system[3]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[3]
Model—Glen/YES 1000FP[3]
Designed use—Designed to accept a range of shelf sizes[3]
Application focus—Changing needs of the flat panel industry[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]manualslib.commanualslib.com
  3. [3]web.archive.orgweb.archive.org