Waferpedia

Comparison ledger

TP 500 Implant Dose Measurementversus0216 7696, E 11368072 ESC

KLA TP 500 Implant Dose Measurement, Varian 0216 7696, E 11368072 ESC, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMKLAVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA TP 500 Implant Dose MeasurementVarian 0216 7696, E 11368072 ESC
Specifications
ConfigurationSingle Phase[1]Platen ADV-S Type[5]
Voltage120 V[1]—
Circuit Breaker20[1]—
Full Current Load7.5[1]—
Power ConfigurationSingle Phase[1]—
Frequency50/60 Hz[1]—
Circuit Breaker Rating20[1]—
Optics ConfigurationCamera Only[2]—
Wafer Size200 mm[4]—
Type—ESC Platen ADV-S Type[5]
Category—Ion Implantation[6]

Plan your fab

Building a Ion Implantation process? Get a complete equipment list.

Open the fab equipment planner →
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]inventory listing
  6. [6]waferpedia.comwaferpedia.com