Comparison ledger
EV Group 620, EV Group 620 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 620EV Group | 620 MaskEV Group |
|---|---|---|
| OEM | EV Group | EV Group |
| Category | Lithography | Lithography |
| Wafer size | — | 3 Station Wafer Handler |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 620 | EV Group 620 |
| Specifications | ||
| Configuration | Mercury Lamp Exposure System[1] | 50 / 60 Hz[3] |
| Voltage | — | 200 V[3] |
| Phase | — | 2 Phase[3] |
| Current Rating | — | 10 A[3] |
| Interrupting Capability | — | 50 kiloamps[3] |
| Overcurrent Protection | — | Provided at machine terminals[3] |
| Frequency | — | 50/60 Hz[4] |
| Power consumption | — | 1.55 kW[4] |
| Full load current rating | — | 7.45 A[4] |
| Largest current rating | — | 7.45 A[4] |
| Breaker size / AIC | — | 10 A / 10 kA[4] |
| Compressed Air (CDA) | — | 6 bar / 87 psi[4] |
| Nitrogen or CDA | — | 6 bar / 87 psi[4] |
| Vacuum | — | < 850 mbar / 6460 torr[4] |
| Wafer Sizes | — | 2, 3, 4, 5, 6, 12 inch[4] |
| Backside Alignment | — | Capable[5] |
| Infrared Alignment | — | Capable[5] |
| Chuck Size | — | 5 inch to 6 inch[5] |
| OEM | — | EV Group[3] |
| Model | — | 620 Mask[3] |
| Equipment type | — | Mask Aligner[3] |
| Category | — | Lithography[3] |
| Wafer size | — | 4 inch[3] |
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