Waferpedia

Comparison ledger

501 Waferversus520 IS Wafer

EV Group 501 Wafer, EV Group 520 IS Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
501 WaferEV Group
520 IS WaferEV Group
OEMEV GroupEV Group
CategoryPackaging & BondingPackaging & Bonding
Wafer sizeManual wafer load substrate bonderManual wafer load substrate bonder
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group 501 WaferEV Group 520
Specifications
Wafer sizeManual wafer load substrate bonder[1]Manual wafer load substrate bonder[4]
ConfigurationCapable of fusion compression bonding[1]Refurbished[3]
Max Bond Force7 kN[1]60 kN[4]
Top side heater550°C max. in 1°C steps[1]550°C max. in 1°C steps[4]
Bottom side heater550°C max. in 1°C steps[1]550°C max. in 1°C steps[4]
Temperature uniformity± 1,5 %[1]± 1,5 %[4]
Wafer sizes2, 3, 4, 5, 6 inch (up to 150 mm)[1]—
Substrate sizesingle chips to 200 mm[2]—
Max bond force7 kN (source 1) or up to 20 kN (source 2)[1]—
Top side heater max temperature550°C in 1°C steps (source 1)[1]550°C in 1°C steps[4]
Bottom side heater max temperature550°C in 1°C steps (source 1)[1]550°C in 1°C steps[4]
Maximum temperature (source 2)up to 450°C[2]—
Vacuum (standard)1x10-1 mbar[2]—
Vacuum (optional)1x10-5 mbar[2]—
Power supply for anodic bonding0-2000 V, 0-50 mA[2]—
Footprint0.8 m2[2]—
Conversion timeless than 5 minutes[2]—
Control softwareWindows-based[1]Windows based control software and operation interface[4]
OEM—EV Group[3]
Model—520 IS Wafer[3]
Category—Packaging & Bonding[5]
Description—Manual wafer load substrate bonder[5]
Bonding capabilities—Capable of fusion compression bonding, thermal compression bonding, and optional anodic bonding[4]
Bond chamber—High-vacuum capable bond chamber[4]
Included items—Chiller; turbo pump & controller; roughing pump; system computer, monitor, and keyboard[4]
Other stated features—Auto opening of bond tool cover; high-vacuum capable bond chamber; ideal for R&D and pilot production applications[4]
Vintage—2008[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]aggiefab.tamu.eduaggiefab.tamu.edu
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]waferpedia.comwaferpedia.com