Comparison ledger
EV Group 120 Automated Coater Processing, Tokyo Electron MK 7 S, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 120 Automated Coater ProcessingEV Group | MK 7 STokyo Electron |
|---|---|---|
| OEM | EV Group | Tokyo Electron |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 120 Automated Coater Processing | Tokyo Electron MK 7 S |
| Specifications | ||
| Configuration | 50/60 Hz[1] | SD/HD Typ Commandpost[2] |
| Phase | 3 Phase[1] | — |
| Wafer sizes | 6 inch, 8 inch[1] | 8 inch[2] |
| Frequency | 50/60 Hz[1] | — |
| Wiring configuration | 4 Wire + GND[1] | — |
| Vintage | 2015[1] | 1995[2] |
| System Vers | — | MK8G2.38[2] |
| Alarm File | — | ALM00166.OEN[2] |
| Lines | — | 1(3)[2] |
| Pumps | — | 1x mini[2] |
| Backrinse | — | yes[2] |
| Rinse | — | yes[2] |
| Missing | — | resist pumps (2), developer line[2] |
| Wafer Size | — | 8 inch[2] |
| Type | — | SD/HD Typ[2] |
| System Version | — | MK8G2.38[2] |
| GEM | — | 1.72[2] |
| EBR | — | programmable[2] |
| T/H-Controller | — | Shinwa CP-I[2] |
| H-Nozzle Lines | — | 1 x H-Nozzle[2] |
| OEM | — | Tokyo Electron[2] |
| Model | — | MK 7 S[2] |
| Category | — | Coater / Developer[2] |
| Special alarm file | — | AL00TT.OEN[2] |
| GEM version | — | 1.72[2] |
| H-Nozzle | — | 1 x H-Nozzle[2] |
| Control Interface | — | Commandpost[2] |
| EBR Programmable | — | yes[2] |
| Equipment type | — | Coater / Developer[2] |
| Spare alarm file | — | AL00TT.OEN[2] |
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