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Comparison ledger

120 Automated Coater ProcessingversusSEZ SP 223 Spin Processing

EV Group 120 Automated Coater Processing, Lam Research SEZ SP 223 Spin Processing, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMEV GroupLam Research
CategoryResist ProcessingResist Processing
Wafer size—Patented Wafer Chuck or Holding Device
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group 120 Automated Coater ProcessingLam Research SEZ
Specifications
Configuration50/60 Hz[1]2 Chambers[2]
Phase3 Phase[1]—
Wafer sizes6 inch, 8 inch[1]—
Frequency50/60 Hz[1]—
Wiring configuration4 Wire + GND[1]—
Vintage2015[1]—
Wafer size—Patented Wafer Chuck or Holding Device[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing