Waferpedia

Comparison ledger

6Mversus1000FP

Dektak 6M, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
6MDektak
OEMDektakYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size6"—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyDektak 6MYES 1000FP
Specifications
Instrument typeStylus profilometer[1]—
Equipment typeCleanroom Instrumentation; Metrology; Microscopy/Surface Analysis; Surface Analysis[1]—
Measured featureFilm step height[1]—
Measurement rangeSteps from 260 microns down to 10 nm[1]—
Additional usesSurface topography profiling and surface roughness measurement in the nanometer range[1]—
Stylus radius25-micron radius high aspect ratio stylus[1]—
Maximum acceptable sample size6 inches[1]—
LocationFNT 4.106[1]—
ContactDr. Raluca Gearba[1]—
Step height measurement range260 µm to 10 nm[1]—
Maximum sample size6 inches[1]—
System type—Plasma cleaning system[2]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[2]
Model—Glen/YES 1000FP[2]
Designed use—Designed to accept a range of shelf sizes[2]
Application focus—Changing needs of the flat panel industry[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]tmi.utexas.edutmi.utexas.edu
  2. [2]web.archive.orgweb.archive.org