Comparison ledger
CEE 100, Nikon NSR 2005 i 11 D i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | |
|---|---|---|
| OEM | CEE | Nikon |
| Category | Lithography | Lithography |
| Wafer size | 6" | Wafer Loader |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | Nikon NSR 2005 |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | Wafer Loader[4] |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Illumination WL | — | i-line[3] |
| Illumination uniformity | — | 2.00%[3] |
| CD unifotmity | — | 400nm[3] |
| Overlay (single machine) | — | 70nm[3] |
| Reticle size | — | 5"[3] |
| Lens reduction | — | 1/5[3] |
| Control System | — | VAX Station[4] |
| Configuration | — | Modules:[5] |
| AC Power Distribution System | — | Electricity Box[5] |
| Manufacturer | — | Nikon[4] |
| Model | — | NSR 2005 i 11 D[4] |
| Category | — | Lithography[4] |
| CD uniformity | — | 400nm[3] |
| Modules | — | Operation Panel; Retical Loader; Wafer Loader; Lens Controller; AC Power Distribution System: Electricity Box[5] |
| Vintage | — | 1996[3] |
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