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FPA 5510 IXversusNSR-2205i11D

Canon FPA 5510 IX, Nikon NSR-2205i11D, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Documented as functional equivalents— Same function class: Lithography, Unknown[1]
Side-by-side comparison of selected equipment models
Attribute
FPA 5510 IXCanon
NSR-2205i11DNikon
OEMCanonNikon
CategoryLithographyLithography
Wafer size——
Process node—0.35 micron
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCanon FPA 5510Nikon NSR-2205i11D
Specifications
ConfigurationNo hard disk[2]—
Tool type—Step-and-Repeat System[1]
Process node—0.35 micron[1]
Node—0.35 micron[1]
Technology Node—0.35 micron[1]
Type—Step-and-repeat system[1]
Resolution node—0.35 micron[1]
Machine type—Step-and-Repeat System[1]
Target design node—0.35 micron[1]
System type—Step-and-repeat system[1]
Target node—0.35 micron[1]
Design node—0.35 micron[1]
Node (resolution)—0.35 micron[1]
Resolution—0.35 micron[1]
Minimum feature size—0.35 μm[1]
Design Rule—0.35 micron[1]
Feature Size—0.35 micron[1]
Description—State-of-the-art workhorse[1]
Equipment type—Step-and-repeat system[1]
Manufacturer—Nikon[1]
FPA 5510 IX entryNSR-2205i11D entryAsk about these tools →Share experience with this comparison →

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Sources (2)Every fact above is drawn from these public sources
  1. [1]chiphistory.orgchiphistory.org
  2. [2]inventory listing