Comparison ledger
Canon FPA 5500 iZa, EV Group 101, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 5500 iZaCanon | 101EV Group |
|---|---|---|
| OEM | Canon | EV Group |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 5500 iZa | EV Group 101 |
| Cited variants |
| — |
| Specifications | ||
| Manufacturer | Canon[2] | — |
| Model | FPA 5500 iZa[2] | 101[5] |
| Category | Lithography[3] | — |
| Tool type | Stepper / Scanner[2] | — |
| Wafer size | 300mm[4] | — |
| Wafer chuck type | Pin chuck[4] | — |
| Projection lens magnification | 1:4[4] | — |
| NA | Variable (0.57~0.45 / 0.01 resolution)[4] | — |
| Exposure light | i Line (365nm)[4] | — |
| Light source | Ultra high-pressure mercury lamp[4] | — |
| Light source manufacturer/model | Ushio Inc. / SUV-4500CIL[4] | — |
| Reticle storage | 14ea (Standard), Nikon type 15ea (Total 29ea)[4] | — |
| Reticle barcode reader | 2D[4] | — |
| OEM | — | EV Group[5] |
| Equipment name | — | EVG 101 Spray Coater[5] |
| NEMO ID | — | evgspraycoat[5] |
| Training required | — | EVG 101 Training[5] |
| Training duration | — | 1.50 hours[5] |
| Processing technique | — | Resist Spray Coat (manual)[5] |
| Cleanliness | — | "All"[5] |
| Location | — | SNF Paul G Allen L107 Cleanroom[5] |
| Wafer diameter (substrate size) | — | up to 300 mm[6] |
| Available modules | — | Spin coat / OmniSpray® / develop[6] |
| Wafer handling options | — | Bowed / warped / thin wafer handling, edge handling[6] |
| Dispense options | — | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[6] |
| Processing technique (at SNF) | — | Resist Spray Coat (manual)[7] |
| Cleanliness group (at SNF) | — | "All"[5] |
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