Comparison ledger
Canon FPA 3000 i 5, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 3000 i 5Canon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 3000 | SUSS MicroTec 150 e Mask |
| Cited variants |
| — |
| Specifications | ||
| Wafer | Notch[1] | — |
| Transfer | L Type[1] | — |
| Reticle cassette | Canon's[1] | — |
| Reticle additional library | no[1] | — |
| PPC unit | no[1] | — |
| Software Version | V13.06B.06[1] | — |
| Configuration | Rasco TBW-CD-83 + Compact Chamber[2] | — |
| Wafer Size | 8 inch[1] | — |
| Wafer Alignment | Notch[1] | — |
| Transfer Type | L Type[1] | — |
| Additional Reticle Library | No[1] | — |
| Included Transfer Module | Rasco TBW-CD-83 + Compact Chamber (2000 Vintage)[2] | — |
| Additional Accessories | Rasco TBW-CD-83 + Compact Chamber 2000 Vintage[2] | — |
| Manufacturer | Canon[3] | — |
| Model | FPA 3000 i 5[3] | — |
| Equipment type | Stepper[3] | — |
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