Comparison ledger
Canon FPA 3000 EX 4, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 3000 EX 4Canon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 3000 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | Main body only[1] | — |
| OEM | Canon[1] | — |
| Model | FPA 3000 EX 4[1] | — |
| Equipment type | Stepper[1] | — |
| Wafer size | 8 inch[3] | — |
| Exposure source | KrF[3] | — |
| Resolution | 250nm[3] | — |
| Type | Stepper[3] | — |
| Light source | KrF excimer laser[3] | — |
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