Comparison ledger
Axcelis 200 ACU, Tokyo Electron TE 8500 P Dry, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | TE 8500 P DryTokyo Electron |
|---|---|---|
| OEM | Axcelis | Tokyo Electron |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Tokyo Electron TE 8500 |
| Specifications | ||
| Configuration | Parts Machine[1] | 1 chamber[5] |
| Manufacturer | Axcelis[1] | — |
| Model | 200 ACU[1] | — |
| Tool type | Asher[1] | — |
| Wafer size | 200mm[3] | 6 inch[6] |
| Serial number | AU6A356AH[3] | — |
| Computer system | M 200 PC, M 200[4] | — |
| Part number | SC 4572 A[4] | — |
| Volts | 208[4] | — |
| Amps | 30[4] | — |
| Equipment type | Asher[1] | — |
| Wafer configuration | 8 inch[2] | — |
| Gas | — | CF4, CHF3, He[5] |
| Chamber count | — | 1[5] |
| Application | — | Oxide etch with endpoint[5] |
| Process gases | — | CF4, CHF3, He[5] |
| Operating system | — | EPROM based[5] |
| Pump | — | 2ea, Kashiyama[5] |
| Vintage (reported) | — | 1996 (some units 1999)[6] |
| Etch Type | — | Oxide etch with end point[5] |
| Gases | — | CF4, CHF3, He[5] |
| Operating System | — | EPROM based system[5] |
| Pump Make | — | Kashiyama (2 units)[5] |
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