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Comparison ledger

Twinscan XT 1400 F ArFversus1505 G 6 E

ASML Twinscan XT 1400 F ArF, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMASMLNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run—1988–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASML Twinscan XT 1400Nikon 1505
Specifications
Configuration50/60 Hz[1]5" reticle[2]
Phase3 Phase[1]—
Power49 kVA[1]—
Full Load Current79 A/PH[1]—
Largest Load27 A/PH[1]—
Max Interrupt CAp35 kA[1]—
Process Module200 mm[1]—
Conversion Kit300 mm[1]—
Frequency50/60 Hz[1]—
Voltage230/400 VAC[1]—
Max Interrupt Capacity35 kA[1]—
Resolution—650 nm[3]
Numerical Aperture—0.54[3]
Reduction—5x[3]
Exposure Field—15 x 15 mm[3]
Alignment Accuracy—130 nm[3]
Wafer Size—4 inch[2]
Light Source—g-line[4]
Introduction Year—1988[3]
NA (Numerical Aperture)—0.54[3]
Make—Nikon[2]
Model—1505 G 6 E[2]
Category—Stepper[2]
Wafer Sizes—4 inch[2]
Exposure type—g-line[3]
NA—0.54[3]
Exposure field—9.3 x 18.8 mm[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]web.archive.orgweb.archive.org
  4. [4]ece.utoronto.caece.utoronto.ca