Comparison ledger
ASML PAS 5500 1150 C Wafer, Nikon 1505 G 6 E, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | |
|---|---|---|
| OEM | ASML | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 1988– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 5500 | Nikon 1505 |
| Specifications | ||
| Configuration | 2x2 cassette/transfer loader[1] | 5" reticle[3] |
| Wafer size | 8 inch[1] | — |
| Category | Lithography[2] | Stepper[3] |
| Laser system | Cymer NL7600A NanoLith laser system, 400V, 70A, mfg 2002[1] | — |
| Wafer loader | 2x2 cassette/transfer loader[1] | — |
| Mains power cabinet | Mains power cabinet[1] | — |
| Filtration unit | Donaldson P199100 LithoGuard filtration unit[1] | — |
| Exhaust blower | Rietschle Thomas SAH 55 (10) exhaust blower[1] | — |
| Exhaust blower cabinet | Rietschle Thomas REL 44050 (23) exhaust blower cabinet[1] | — |
| Uninterruptible power system | Quality Power Solutions uninterruptible power system w/ battery pack[1] | — |
| Power conditioner | Powervar ABC75.0-48D40Y 2000 Series GPI power conditioner, 75kVA[1] | — |
| Resolution | — | 650 nm[4] |
| Numerical Aperture | — | 0.54[4] |
| Reduction | — | 5x[4] |
| Exposure Field | — | 15 x 15 mm[4] |
| Alignment Accuracy | — | 130 nm[4] |
| Wafer Size | — | 4 inch[3] |
| Light Source | — | g-line[5] |
| Introduction Year | — | 1988[4] |
| NA (Numerical Aperture) | — | 0.54[4] |
| Make | — | Nikon[3] |
| Model | — | 1505 G 6 E[3] |
| Wafer Sizes | — | 4 inch[3] |
| Exposure type | — | g-line[4] |
| NA | — | 0.54[4] |
| Exposure field | — | 9.3 x 18.8 mm[4] |
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