Comparison ledger
ASML 5500 350 C, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 5500 350 CASML | 1000 FamilyUltratech |
|---|---|---|
| OEM | ASML | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML 5500 350 C | Ultratech 1000 Family |
| Cited variants |
| — |
| Specifications | ||
| Configuration | With:[2] | — |
| Laser source | Cymer ELS 5600 excimer laser[2] | — |
| Wafer size (configured) | 100 mm (4 inch)[1] | — |
| Vintage year | 1997[2] | — |
| Cluster configuration | In-line with TEL Clean Track ACT-8 coater/developer[1] | — |
| Model | 5500 / 350 C[2] | — |
| Equipment type | Stepper[2] | — |
| Cluster pairing | In-line with the ASML PAS5500/350C stepper to form a DUV lithography cluster[1] | — |
| Configured wafer size | 100 mm (4") wafers[1] | — |
| Alternate designation | ASML PAS 5500/350C[1] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[3] |
| Optical design | — | Wynne Dyson[3] |
| Magnification | — | 1X[3] |
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