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Comparison ledger

VIISta HCP+versus160 XP Ion

Applied Materials VIISta HCP+, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
VIISta HCP+Applied Materials
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials VIISTAVarian 160 XP Ion
Specifications
ConfigurationHigh Current[1]150mm High Current IMP[4]
OEMApplied Materials[2]Varian[5]
ModelVIISta HCP+[2]160 XP Ion[5]
Machine typeHigh current ion implanter[3]—
Wafer size12 inch[1]—
Category—Ion Implantation[4]
Tool type—ion implanter[4]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com
  4. [4]waferpedia.comwaferpedia.com
  5. [5]Equipment inventory listing